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Spin Cleaner (Wafer Mask Cleaner)
Spin Cleaner Spin Dryer Wet Bench
Spin Cleaner (Wafer Mask Cleaner)
Product Overview
Our spin cleaner features absolutely no dripping over substrates upon lid opening, customizable RPM: 6,000;8,000;12,000rpm, high profile AC Servo Motor instead of DC Motor, and new generation of PAC.
Spin Cleaner
Suitable Size 2"-12" Wafer
Spin Cleaner
Application
  • Developing Process
  • Etching Process
  • Stripping Process
  • Cleaning Process
  • Mask Cleaner
Operation Mode Auto / Semi-Auto / Manual
Product Type Wet Bench or Wet station
Product Feature
  1. Use quality pipe and valve component
  2. Use PAC for electronic controller
  3. Robotic horizontal and vertical stroke for high accuracy, stability and positioning
  4. Quarantine zone for both acidic gas and electrical substance
  5. Flexible disposition scheme for QDR
  6. Modularized pipeline installment allows swift and convenient maintenance
  7. Product design is highly adaptable to fit in customized environment according to the actual needs
Available Options
  • Class 100 or 1000
  • CIM Connect
  • Chemical Supply System
  • CO2 / IR
  • PLC / PC Base / PAC
  • Datalogic
  • Temperature Measurement Data Acquisition System
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Copyright © 2008 Swift Rich Technology
Address :4F., No.101, Sec. 3, Nanjing East Road., Jhongshan District, Taipei City, Taiwan (R.O.C.)
Phone : +886-2-82572175 Fax : : +886-2-82573663 Mobile : +886-0915-072-563
24Hr Service Hotline: +886-915-072-563

SRT specializes in multi-spin coater, wafer-related manufacturing equipments such as spin cleaner, spin dryer, die flipper, wafer expander, and wafer mounter

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