Spin Dryer / Spin Rinse Dryer |
 
Wet Bench
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Spin Dryer
Spin Dryer
Spin Rinse Dryer
Product View |
- Patent protected
- Low breakdown rate
- High durability
- Space-saving
- Electronic-Wiring Control
- Modularized mechanism: any broken module can be replaced instantly
- Able to collaboratively work with IPA Rinse
- Short Wafer Drying Time (Approximately 3 - 5 minutes)
- No water stains upon wafer drying completion
- Low cracking rate upon drying
- Suitable for thin wafer and cracked wafer
- Short pre-heating time
- Multiple safety gadgets
- Providing DEMO service upon request
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| Product Application | 2" - 6" wafer |
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| Demo service | Please contact us for Spin Dryer DEMO service, specification booklets, or price quote |
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